Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1796519 | Journal of Crystal Growth | 2007 | 7 Pages |
Abstract
Lithium tantalate (LiTaO3) thin films were deposited on ruthenium dioxide (RuO2) electrode by reactive radio frequency (RF) magnetron sputtering with a lithium dioxide–tantalum pentoxide (Li2O2/Ta2O5) (50–50% mole ratio) target. This article presents morphological, structural, dielectric and pyroelectric studies of LiTaO3 thin films as function of growth conditions (RF power, gas pressure and temperature). The final aim is to improve the pyroelectric coefficient for thermal detectors applications. The best pyroelectric coefficient of LiTaO3 thin films (400 nm) equal to 60 μC/m2 K was obtained for a growth temperature of 400 °C, and a pressure of 10 mTorr.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Philippe Combette, Laurianne Nougaret, Alain Giani, Frédérique Pascal-delannoy,