Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1796989 | Journal of Crystal Growth | 2006 | 5 Pages |
Abstract
A reliable method for depositing a layer of carbon on the inner walls of a fused silica ampoule is described and characterized. Carbon deposition rates were found to be 0.33 μm/h at mid-length and range from 0.26 to 0.55 μm/h at the ends of a 150 mm long ampoule. Deposition rate was found to vary along the length of the ampoule, but not along the radial perimeter.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Mark J. Harrison, Adam P. Graebner, Walter J. McNeil, Douglas S. McGregor,