The role of annealing temperature on the structural and magnetic consequences of Ta/PrFeB/Ta thin films processed by rapid thermal annealing

•The role of annealing temperature on the magnetization reversal mechanism was evaluated.•It was found that with an increase in temperature, the exchange interaction decreased.•Dependence of magnetic features of annealed PrFeB thin films on Ta buffer layer was evaluated.

Ta/PrFeB/Ta thin films were deposited on CORNING 7059 by sputtering technique followed by rapid thermal annealing (RTA). The thickness of PrFeB was kept constant at 50 nm. The role of annealing temperature from 450 to 700 °C in a step of 50 °C for constant heating time of 60 s on the structural and magnetic consequences of thin films was studied by means of X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy and vibrating sample magnetometer. The (00l) texture was almost fully developed at temperature of 650 °C and with an increase in temperature up to 700 °C the (105) peaks was also appeared in the patterns. The grains size and surface roughness of PrFeB films were increased by an increase in temperature. It was found that with an increase in temperature up to 500 °C the coercivity was developed and enhanced to 0.75 MA/m by further increasing of temperature to 650 °C. The maximum remanent-magnetization ratio and coercivity were obtained at temperature of 650 °C. The magnetization reversal process is accompanied by the combination of domain wall motion (DWM) and Stoner–Wohlfarth (S–W) rotation. However, for PrFeB films annealed at 550–700 °C it is closer to the S–W model than DWM modes.