| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1800706 | Journal of Magnetism and Magnetic Materials | 2011 | 4 Pages |
Abstract
⺠Water-based polishing slurry shows active motion under AC electric field. ⺠Applied electric field gathers the slurry around the polishing area. ⺠Glass polishing removal rate is improved under AC electric field.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Takayuki Kusumi, Yasuhiro Sato, Yoichi Akagami, Noritsugu Umehara,