Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1800997 | Journal of Magnetism and Magnetic Materials | 2010 | 4 Pages |
Abstract
A new method was developed to control Co film oxidation in an epitaxially grown Cu(wedge)/Co/Cu(0 0 1) film. By annealing the film at 200 °C within 10â6 Torr oxygen environment, we find that the top Cu wedge controls the Co underlayer oxidation continuously as a function of the Cu film thickness. Magneto-Optic Kerr Effect measurement shows that the exchange bias of the resulting CoO/Co film exhibits a systematic variation with the Cu thickness, thus offering a new method of tailoring the exchange bias of CoO/Co films.
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Authors
J. Wu, J. Park, W. Kim, Chanyong Hwang, Z.Q. Qiu,