AFM lithography for fabrication of magnetic nanostructures and devices

Nanostructures of oxide were fabricated on ferromagnetic thin films by a nano-oxidation technique using an atomic force microscope. Electrical and magnetic properties in the magnetic nanostructures were directly modified by the nano-oxidation. A ferromagnetic single electron transistor exhibited a single electron tunneling due to the Coulomb blockade effect. A direct modification of magnetic domain structures was also achieved by this nano-lithography technique.