Development of buffer layers on 30Â mm wide textured metal substrates for REBCO coated conductors

The buffer layers consisted of three layers; CeO2 as the seed layer, yttrium-stabilized zirconia (YSZ) as the diffusion barrier layer and CeO2 as the lattice matching layer. They were grown by the RF-sputtering method and the electron beam evaporation technique (EB). EB deposition has possibility of higher throughput compared with the RF-sputtering. The intensity ratio of (2 0 0) to (2 0 0) + (1 1 1) for the lattice matching layer showed as high as 98%. The uniform properties of 40 m long and 30 mm wide substrates were successfully produced by all sputtering method. Additionally, the tape travel speed of the seed layer can be increased from 7 m/h (RF-sputtering deposition) to 10 m/h (EB deposition) on short sample (0.3 m long).