Different parameters for the deposition of La1.85Sr0.15CuO4 and Nd1.85Ce0.15CuO4 superconducting films by the novel pulsed electron deposition technique

Parameters in the pulsed electron deposition process for fabricating high-TC cuprate superconducting films, p-type La1.85Sr0.15CuO4 (LSCO) and n-type Nd1.85Ce0.15CuO4−δ (NCCO) are discussed, including the substrate temperature, the deposition pressure, the target-to-substrate distance, the pulse frequency and the post-annealing process. They are very different when compared between the two distinct films. When the parameters vary in the deposition process, the changes in the superconductivity or microstructure of LSCO and NCCO are clearly shown. Meanwhile, the relation of the parameters is also studied in detail.