| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1822543 | Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment | 2014 | 6 Pages |
Abstract
Xenon self-diffusion on amorphous Al2O3 surfaces has been studied using molecular dynamics (MD) simulations. The results show that the topology of the amorphous alumina surface has a considerable effect on the mobility of Xe. Adding nanoscale scratches to the surface will both increase the adsorption energies and lower the surface diffusion coefficients. These findings give a possible explanation to the need for unexpectedly thick ALD deposited amorphous Al2O3 films used as gas diffusion barriers on polymeric systems.
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Authors
L. Bläckberg, E. Metsanurk, A. Tamm, A. Aabloo, M. Klintenberg,