Article ID Journal Published Year Pages File Type
1864626 Physics Letters A 2006 5 Pages PDF
Abstract

Amorphization of crystalline silicon is achieved by irradiation of energetic argon ions generated in the dense plasma focus. Raman spectroscopy and X-ray diffraction of crystalline and irradiated samples show that crystalline silicon transforms into completely disordered structure through polycrystalline and amorphous phases on increasing the implanted dose.

Related Topics
Physical Sciences and Engineering Physics and Astronomy Physics and Astronomy (General)
Authors
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