Fabrication of High Jc (Bi,Pb)2223 Thin Films by PLD and Post-annealing Process

(Bi,Pb)2Sr2Ca2Cu3Oy ((Bi,Pb)2333) has high critical temperature (Tc) compared to REBa2Cu3Oy. However, (Bi,Pb)2223 has a disadvantage that the critical current density (Jc) seriously degrades in magnetic fields. We succeeded to fabricate (Bi,Pb)2223 epitaxial thin films by pulsed laser deposition (PLD) method using Nd:YAG pulsed laser deposition and post-annealing process. In addition, we tried to improve Jc in the magnetic fields by introducing Y2O3 or Al2O3 as artificial pinning centers (APCs). As a result, we fabricated (Bi,Pb)2223 thin films that had high Jc in self field at 77 K of 0.4 MA/cm2. The main phase of the thin films introduced Y2O3 was Bi2212. On the other hand, the main phase of the thin films introduced Al2O3 was Bi2223, however, the formation of Ca2PbO4 resulted in the decline of Jc.