Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1872433 | Physics Procedia | 2011 | 4 Pages |
Abstract
A set of silicon substrates processed by compression plasma was studied by means of atomic force microscopy (AFM). AFM data revealed a threshold nature (in terms of plasma flow energy) of the formation of tube-like surface structures (SS) observed as “waves” regardless of the conductivity type, resistivity, and the substrate orientation ((111) or (100)). For the first time nanoheterostructures Si(111)/NC CrSi2/Si and Si(100)/NC β-FeSi2/Si have been formed on silicon substrates processed by compression plasma flow. Avery high density of CrSi2 nanoislands - (2-3)Ã1011 cmâ2 was obtained for Cr-Si system but in the case of Fe-Si system the β-FeSi2 nanoislands density was only about 2Ã109 cmâ2. According to the optical spectroscopy data during the process of silicon capping layer formation the CrSi2 and β-FeSi2 nanocrystals move up to the surface.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Physics and Astronomy (General)
Authors
Nikolay G. Galkin, Valiantsin M. Astashynski, Evgenii A. Chusovitin, Konstantin N. Galkin, Tatyana A. Dergacheva, Anton M. Kuzmitski, Evgenii A. Kostyukevich,