Study of As50Se50 Thin Film Dissolution Kinetics in Amine based Solutions

Chalcogenide glass thin films are suitable materials for micro optical elements fabrication due to their convenient physical and chemical properties. They are generally photosensitive and thus can be selectively etched. Therefore they can be exploited as photoresists in photolithography. In this paper we deal with the study of As50Se50 thin films dissolution kinetics in EDA based solutions. The detailed evolution of the etching curves is discussed and the dependences of the average etching rate on the composition and temperature of the etching bath are described.