Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1877251 | Applied Radiation and Isotopes | 2007 | 5 Pages |
Abstract
The sensitivity of the LR 115 detector inside a diffusion chamber to 220Rn gas concentration is dependent on the removed active layer thickness during chemical etching. This dependence is related to the V function for the LR 115 detector (where V is the ratio between the track etch velocity Vt and the bulk etch velocity Vb) and the geometry of the diffusion chamber. The present paper presents the experimentally determined relationship between the sensitivity of the LR 115 detector inside a Karlsruhe diffusion chamber (determined from the number of etched tracks completely penetrating the active cellulose nitrate layer) and the removed active layer thickness. These data were used to derive the V function for the LR 115 detector, which took the functional form of the Durrani-Green's function, i.e., V=1+(a1e-a2R+a3e-a4R)(1-e-a5R), with the best-fitted constants as a1=14.50, a2=0.50, a3=3.9 and a4=0.066.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
S.Y.Y. Leung, D. Nikezic, J.K.C. Leung, K.N. Yu,