Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1881724 | Radiation Measurements | 2009 | 4 Pages |
Abstract
An analysis concerning the bulk etch rate of different type of CR-39 subjected to a chemical etching in 5.4 N KOH solution at 80 °C is carried out in the present work. The response of PADC samples has been evaluated adopting the fission fragment track diameter method. A standard quality control program for etching has been set up by monitoring the electrical conductivity of the etchant. Since the properties of the etching solution are constant during the etching process the difference in the Vb values are connected to the intrinsic characteristics of the CR-39 plastic such as polymerization processes.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
F. Leonardi, M. Caresana, M. D'Alessandro, R. Mishra, S. Tonnarini, R. Trevisi, M. Veschetti,