| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 189636 | Electrochimica Acta | 2011 | 7 Pages |
The effects of introduced supporting electrolyte on the galvanic deposition of Cu2O crystals have been investigated using scanning electron microscopy (SEM), energy-dispersive X-ray (EDX), X-ray diffraction (XRD). The results show that the chemical nature of supporting electrolytes plays very important roles in the galvanic deposition of Cu2O crystals. The chloride stabilizes the (1 0 0) planes of Cu2O crystals, resulting in the formation of cubic crystals, while nitrate, sulfate and fluoride stabilize the (1 1 1) planes of Cu2O crystals, leading to the deposition of truncated octahedral and octahedral Cu2O crystals. It provides a facile way to control the morphology of galvanically obtained Cu2O crystals by indirectly adjusting the inorganic adsorption agents.
► The effects of electrolyte on the galvanic deposition of Cu2O crystals have been investigated. ► The chemical nature of supporting electrolyte plays important roles in the galvanic deposition of Cu2O crystals. ► Cubic Cu2O crystals are formed in chloride electrolytes. ► Truncated octahedral Cu2O crystals are produced in nitrate, sulfate and fluoride electrolytes.
