Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
197029 | Electrochimica Acta | 2005 | 6 Pages |
The spacing and thickness of tin (Sn) latticeworks, formed in oscillatory electrodeposition, were tuned through modulation of the oscillation by changing the applied current density (jap) and the concentration of Sn(II) ions (CSn) in the electrolyte. When the jap was made higher or the CSn was made lower, the time of transition from the negative-side to positive-side potential (t1) of the oscillation became longer and the lattice spacing (d) of the latticework was enlarged. The modulation by the jap change was especially interesting because it was simple and produced, e.g., a latticework with different spacings. The tuning of the latticework by the oscillation modulation was understood within the framework of our previously proposed model for the formation of latticeworks by oscillatory electrodeposition.