Article ID Journal Published Year Pages File Type
219135 Journal of Electroanalytical Chemistry 2013 9 Pages PDF
Abstract

The effect of several p-substituent groups (–F, –CH3, –OH, –COOH, –NHCOCH3) on the performances and the stability of aromatic monolayers on copper has been studied. All the results agreed indicating that such aromatic films are very stable and effective as corrosion inhibitors even in harsh conditions (aerated H2SO4 0.5 M). Nevertheless, while XP spectroscopy showed an excellent chemical stability for all the layers regardless the terminal groups, EIS measurements highlighted notably different protective properties and durability for the various SAMs. Such passivation depends not only on the hydrophobicity of the terminal group but, surprisingly, also on the electronic effect of the substituent on the ring as well. In particular, molecules having an electron-withdrawing substituent showed good passivity at first, a steep increase of their protective properties following the exposure to the electrolyte but a relatively poor stability. The presence of an electron-donating substituent, on the other hand, led to relatively poor initial protection, a slow reorganization but an exceptionally long durability.

► Aromatic SAMs are very durable and effective copper corrosion inhibitors in H2SO4. ► Regardless the tail group, SAM passivation increases in contact with the electrolyte. ► Their long-term durability is tuned by electronic effects of the substituent group. ► Electron-donating substituents promote exceptionally long SAM durability.

Related Topics
Physical Sciences and Engineering Chemical Engineering Chemical Engineering (General)
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