Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
228889 | Journal of Industrial and Engineering Chemistry | 2010 | 4 Pages |
Abstract
We investigated the effect of anti-static additive added pressure-sensitive adhesives (PSAs) on light-leakage phenomena for four different PSA sample series of pristine PSA without additive and with each of quinoline, N-hexylpyridinium triflorosulfonylimide, and light controllable anti-static agent. Using a CCD camera apparatus, we found that the anti-static additive added PSAs not only reduce the light leakage but also decrease the surface resistance. Especially, light controllable anti-static agent shows a good anti-light-leakage property and anti-static performance.
Keywords
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Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Min Soo Yang, Seung Woo Ko, Hyoung Jin Choi,