| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 228953 | Journal of Industrial and Engineering Chemistry | 2014 | 7 Pages |
•Copper containing methacrylic polymers were successfully synthesized.•Copper nano-networks and/or nanoparticles could be obtained by chemical reduction using copper containing polymers as precursors.•Copper patterns were prepared through an electron beam lithography process.
Copper containing methacrylic polymers were prepared by the polymerization of a copper methacrylate complex (Cu[CH2C(CH3)COO](COD), where COD = 1,5-cyclooctadiene) with different methylmethacrylate and methacrylic acid compositions. These polymers were found to be soluble in many organic solvents including THF and chloroform. Copper nano-networks or aggregated nanoparticles were obtained when a THF solution of the polymers was reduced using an aqueous sodium borohydride solution. When a thin film of the polymers coated on a silicon wafer was irradiated with an electron beam, nanoparticles were produced on the irradiated area, while the non-irradiated areas could be washed away with a weak base developer, such as a tetramethylammoniumhydroxyde (TMAH) aqueous solution, to produce a copper pattern through an electron beam lithography process.
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