Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
231465 | The Journal of Supercritical Fluids | 2009 | 7 Pages |
We studied supercritical carbon dioxide fluid deposition of titanium oxide (TiO2) in trench features on Si substrates using a flow-type deposition apparatus from titanium diisopropoxide bis(dipivaloylmethanate), aiming at fabricating conformal films at a relatively low temperature. We investigated the deposition rate and step coverage under a fluid temperature from 40 to 60 °C, a pressure from 8.0 to 10.0 MPa, and a substrate temperature from 80 to 120 °C. They were dependent on the fluid density, indicating that the solubility difference between the bulk fluid and the neighborhood of the substrate surface plays a decisive role for the deposition. An excellent conformal filling of the trench features was achieved from the fluid of 60 °C under 8 MPa on the substrate kept at 80–100 °C. The XPS spectra of the deposited film suggested partial formation of TiO2, and the XRD spectra showed the existence of some crystalline TiO2 (anatase).
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