| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 241353 | Proceedings of the Combustion Institute | 2011 | 8 Pages |
An experimental study has been performed to examine some elementary reactions of the complex kinetics of SiCl4 based mixtures used for the formation of silica (SiO2) synthesized by gas phase combustion. The reactivity of SiCl4/N2O mixtures was studied behind reflected shock waves and the atomic resonance absorption spectroscopy (ARAS) was applied for time-resolved measurements of O-atoms in gas mixtures, highly diluted in argon, containing up to 100 ppm SiCl4 and up to 20 ppm N2O. The absorption profiles obtained are kinetically evaluated by a modeling study based on a detailed reaction mechanism with 61 species and 89 reactions. Rate constants for reactionsSiCl3+O→productsSiCl2+O→SiClO+Clare determined at temperatures comprised between 1750 and 3010 K and pressures comprised between 1.1 and 2.4 bar.
