| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 271824 | Fusion Engineering and Design | 2011 | 4 Pages |
The paper gives a short overview on tungsten (W) coatings deposited by various methods on carbon materials (carbon fibre composite – CFC and fine grain graphite – FGG). Vacuum Plasma Spray (VPS), Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) techniques are analyzed in respect with the characteristics and performances of the W coatings.A particular attention is paid to the Combined Magnetron Sputtering and Ion Implantation (CMSII) technique, which was developed during the last 4 years from laboratory to industrial scale and it is successfully applied for W coating (10–15 μm and 20–25 μm) of more than 2500 tiles for the ITER-like Wall project at JET and ASDEX Upgrade. This technique involves simultaneously magnetron sputtering and high energy (tens of keV) ion implantation. Due to the ion bombardment a stress relief occurs within the coating enabling its growth without delamination to a relatively large thickness. In addition, in order to adjust the thermal expansion mismatch between CFC and W, a Mo interlayer of 2–3 μm is currently used. Experimentally, W/Mo coatings with a thickness up to 50 μm were produced and successfully tested in the GLADIS ion beam facility up to 23 MW/m2.
