Application of minimum projection uniformity criterion in complementary designs

In this article, we consider the characterization problem in design theory. The objective is to characterize minimum projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity (MPU) rule to assess and compare two-level factorials.