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Nanoscale investigations: Surface potential of rare-earth oxide (Re2O3) thin films by kelvin probe force microscopy for next generation CMOS technology

Article ID Journal Published Year Pages File Type
4985706 Surfaces and Interfaces 2016 8 Pages PDF
Keywords
KPFMEr2O3cpdRapid thermal annealingHigh-κFurnace annealingThin films
Related Topics
Physical Sciences and Engineering Chemical Engineering Colloid and Surface Chemistry
Preview
Nanoscale investigations: Surface potential of rare-earth oxide (Re2O3) thin films by kelvin probe force microscopy for next generation CMOS technology
Authors
Pawan Kumar, Robin Khosla, Satinder K. Sharma,
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Journal
Surfaces and Interfaces
Journal: Surfaces and Interfaces
Related Categories
KPFM
Er2O3
cpd
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High-κ
Furnace annealing
Thin films
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