Article ID Journal Published Year Pages File Type
5005932 Materials Science in Semiconductor Processing 2017 7 Pages PDF
Abstract

Herein we report, the photosensitivity of in-situ chemical bath deposition (CBD) grown CuS thin film for the first time, also comparatively very short deposition time of 40 min and much lower bath temperature i.e. 45 °C are reported. The structural, surface topographical, optical, electronic and electrical properties of as-grown CuS thin film have been investigated. The XRD analysis revealed the formation of Orthorhombic (Covellite) structure with preferential growth along [113] direction having ~14 nm average crystallite size. Raman spectrum indicating a sharp peak at 474 cm−1 confirms the formation of CuS covellite structure. Polycrystalline nature of the film has been confirmed from the concentric ring pattern obtained from TEM-SAED and AFM revealed the rough surface topography with RMS roughness of ~27 nm. The bond lengths of Cu(1)-S(1) and S(1)-S(1) were obtained from the DFT calculations based on GGA approximation, suggest S-S bond is much stronger as compared to Cu-S bond; these results are in good agreement with the Raman result. The film shows higher absorbance in the visible region with a band gap of 2.2 eV. The electrical properties show a drastic increase in current after light illumination of 50 W which increases with increasing light intensity and tends to attain a saturation state around 200 W. The highest photosensitivity of ~66% has been calculated for 200 W with fast response time of ~34 s and a complete recovery. These results represent CuS thin films promising candidature for photosensor application.

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Physical Sciences and Engineering Engineering Electrical and Electronic Engineering
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