Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5005973 | Materials Science in Semiconductor Processing | 2017 | 6 Pages |
Abstract
The continuous growth of bulk Si in the Si-Al alloy using the temperature gradient zone melting (TGZM) technique is an effective method to separate the primary Si from the eutectic structure in the Si-Al alloy and to remove the majority of impurities, such as metals, B and P elements during the alloy refining process. A Si source was used to maintain the Si concentration in the alloy melt and reduce the influence of the solute-transmitting process by temperature gradient due to the precipitation of the primary Si. Bulk Si could be obtained in the Si-Al alloy through the TGZM process. With the initial temperature of 1461Â K and temperature gradient of 1.81Â K/mm, the actual growth rate of the bulk Si was 0.000186Â mm/s. No inclusions and alloy phases were observed in the bulk Si. The removal rate of Fe impurity was 99.9% and the removal fraction of B, P and Al was 71.2%, 90.2%, 78.5% respectively.
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Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
Jiayan Li, Liang Wang, Ping Ni, Yi Tan,