Size and density controlled Ag nanocluster embedded MOS structure for memory applications

Metal-nanoclusters (NC), deposited by magnetron-based nanocluster source coupled with quadrupole mass filter (QMF) assembly having independent control over their size and density, are used in fabricating NC-based non-volatile memory (NVM) devices. The effect of diameter and density on the NVM charge storage characteristics are presented where Ag is used as the metal NC. The Ag-NC, sandwiched between HfO2 tunnel and control oxides, is deposited by using the combination of the above two instruments. No annealing is performed at any stage of the device fabrication. The largest hysteresis loop area in the capacitance-voltage (C−V) characteristics of metal-oxide-semiconductor (MOS) characteristics is observed for a cluster density of 1×1011 cm−2. Further, an NC size dependent hysteresis loop area is observed with the MOS devices where the NC diameter is varied from 3 to 1.5 nm keeping the NC density at 1×1011 cm−2. The device performance is found to be improved with a reduction of the NC size and shows its best with the NC diameter of 1.5 nm. The storage time of the NVM devices also increases with the decrease in the NC diameter and exhibits their best performances for the NCs with a diameter of 1.5 nm.