Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5010303 | Solid-State Electronics | 2017 | 7 Pages |
â¢Using lower εlk for outer-spacer of dual-k structure can reduce the total capacitance as the level of single εlk spacer.â¢Using higher εhk for inner-spacer of dual-k structure boosts the on-current as the same range of single εhk spacer due to the gate-fringing field effect.â¢At the off-state, most of drain potential is dropped to the outer spacer capacitance and has little effect to the channel. Thus, using lower εlk for outer spacer shows the lower off-current, SSavg and DIBL.
In this work, dual-k spacer structures are investigated using a variety of materials along the high-k spacer length in detail. It is known that not only the higher permittivity materials of high-k spacer boost the on-current but also lower permittivity materials of low-k spacer effectively reduce the off-current. By compared the results of other various single spacers and dual-k spacers, it is HfO2/Vacuum dual-k spacer that shows relatively higher ION, ION/IOFF, better immunity of short channel effects and outstanding device performances.
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