| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5024126 | Materials & Design | 2017 | 8 Pages |
Abstract
The ultra-low reflection CuO/Cu material in UV-vis range is successfully designed and achieved, via orderly growing ultralong CuO nanowires to construct the thick and vertically aligned array. The blackest sample obtains anultra-low reflectance of 0.078% in 200-700Â nm region. The preparation method of the above ultra-low reflection material is suitable for industrial production.169
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Authors
Xingli Wang, Xiaofeng Wu, Long Yuan, Keke Huang, Shouhua Feng,