Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5140768 | Talanta | 2017 | 6 Pages |
Abstract
A rapid, reagent-less calorimetric method was developed for automatic on-line H2O2 quantification in industrial alkaline semiconductors etching solution. The method is based on the H2O2 catalytic decomposition by immobilized MnO2 generating heat proportional to its concentration and the employment of the Temperature-Time curve slope as a measure of the concentration.192
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
Roumen Zlatev, Margarita Stoytcheva, Benjamin Valdez, Rojelio Ramos,