Xenon difluoride plasma fluorination of polymer surfaces

Xenon difluoride (XeF2) plasma treatment of a series of polymers containing different repeat units gives rise to varying levels of surface fluorination. Alkene and aromatic C-H bonds appear to be more susceptible towards reaction compared to their sp3 counterparts. The extent of fluorine incorporation can be accounted for in terms of a structure-behaviour relationship derived from extended Huckel molecular orbital calculations. Comparison with CF4 plasma modification shows that XeF2 electrical discharges are more effective at fluorinating polymer surfaces.

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