Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5190771 | Polymer | 2005 | 6 Pages |
Abstract
We demonstrate a method to fabricate microscopic topographic patterns over a large area. The idea is based on anisotropic dewetting of a previously rubbed polymer film. Two types of patterns are demonstrated. One contains well aligned parallel micro-grooves with widths and separations of about 1 μm. The other contains striped domains of micro-grooves oriented parallel and orthogonal to the stripes in alternation. Although the pattern formation had been demonstrated on 2Ã2 cm2 substrates, this method is scalable to any substrate size and could offer an attractive low-cost alternative to photolithography and soft lithography in very large area applications.
Related Topics
Physical Sciences and Engineering
Chemistry
Organic Chemistry
Authors
Xueyun Zhang, Fengchao Xie, Ophelia K.C. Tsui,