| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5207427 | Polymer Testing | 2008 | 7 Pages |
Abstract
Thin poly(methyl methacrylate) films have been obtained by casting polymer solution onto borosilicate glass and aluminum supports from organic solvents, such as chloroform, chlorobenzene, toluene, acetone and tetrahydrofuran. Atomic Force Microscopy has been chosen as a method for investigation of the influence of solvent residue and support type on the topography and roughness of the PMMA films before and after UV-irradiation of 254Â nm wavelength. It was found that, besides information on sample morphology, AFM provides valuable details on polymer-support interactions.
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Related Topics
Physical Sciences and Engineering
Chemistry
Organic Chemistry
Authors
Halina Kaczmarek, Hanna Chaberska,