Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5207530 | Polymer Testing | 2008 | 9 Pages |
Abstract
In this work, low-pressure nitrogen plasma has been used to improve wettability in a polyurethane film. Evaluation of wettability changes has been carried out using contact angle measurements. Furthermore, plasma-treated films have been subjected to air aging to evaluate the extent of hydrophobic recovery. X-ray photoelectron spectroscopy (XPS) has been used to study surface functionalization; surface topography changes related with the etching mechanism have been followed by scanning electron microscopy (SEM), atomic force microscopy (AFM) and weight loss study. The results show a considerable improvement in surface wettability even for short exposure times, as observed by a remarkable decrease in contact angle values. The aging study shows a partial hydrophobic recovery due to the re-arrangement of polar species and migration of low molecular oxidized material (LMWOM). In addition to surface activation, SEM and AFM analyses show slight changes in surface topography as a consequence of the plasma-etching mechanism.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Organic Chemistry
Authors
M.R. Sanchis, O. Calvo, O. Fenollar, D. Garcia, R. Balart,