Article ID Journal Published Year Pages File Type
5208660 Progress in Polymer Science 2009 50 Pages PDF
Abstract

The ordering of block copolymers in thin films is reviewed, starting from the fundamental principles and extending to recent promising developments as templates for nanolithography which may find important applications in the semiconductor industry. Ordering in supported thin films of symmetric and asymmetric AB diblock and ABA triblock copolymers is discussed, along with that of more complex materials such as ABC triblocks and liquid crystalline block copolymers. Techniques to prepare thin films, and to characterise ordering within them, are summarized. Several methods to align block copolymer nanostructures, important in several applications are outlined. A number of potential applications in nanolithography, production of porous materials, templating, and patterning of organic and inorganic materials are then presented. The influence of crystallization on the morphology of a block copolymer film is briefly discussed, as are structures in grafted block copolymer films.

Related Topics
Physical Sciences and Engineering Chemistry Organic Chemistry
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