Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5348406 | Applied Surface Science | 2015 | 5 Pages |
Abstract
In this study, Ti-doped indium tin oxide (ITO:Ti) thin films were fabricated using a DC-magnetron sputtering deposition method. The thin films were grown without introducing oxygen or heating the substrate, and no post-growth annealing was performed after fabrication. The thickness of the ITO:Ti thin films (350 nm) was controlled while increasing the sputtering power from 50 to 150 W. According to the results, the optimal optoelectronic properties were observed in ITO:Ti thin films grown at a sputtering power of 100 W, yielding a reduced resistivity of 3.2 Ã 10â4 Ω-cm and a mean high transmittance of 83% at wavelengths ranging from 400 to 800 nm. The optimal ITO:Ti thin films were used to fabricate a Cu(In,Ga)Se2 solar cell that exhibited a photoelectric conversion efficiency of 11.3%, a short-circuit current density of 33.1 mA/cm2, an open-circuit voltage of 0.54 V, and a fill factor of 0.64.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Wei-Sheng Liu, Huai-Ming Cheng, Hung-Chun Hu, Ying-Tse Li, Shi-Da Huang, Hau-Wei Yu, Nen-Wen Pu, Shih-Chang Liang,