Fabrication of superhydrophobic surfaces with nano-in-micro structures using UV-nanoimprint lithography and thermal shrinkage films

After forming the nanoscale pillar patterns on the thermal shrinkage films (TSFs) with nano imprint lithography (NIL), the TSFs were shrunk. Thus, the nano- and microscale complex structures which have superhydrophobic and oleophobic surfaces with nano- and micro-patterns were created. The nano- and microscale complex-patterned (NMCP) TSFs were then coated with a self-assembled monolayer to reduce the surface energy of the structures. After the surface treatment, the contact angle of water on NMCP was measured to be 150.3°, with the films exhibiting self-cleaning behavior. We used the NMCP TSF as a master stamp. By using UV-nanoimprint lithography, the NMCP pattern of polyurethane acrylate was successfully duplicated on a glass substrate. The duplicated NMCP pattern from master stamp had a contact angle with water of 149.8° with superhydrophobicity.