Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5350330 | Applied Surface Science | 2014 | 5 Pages |
Abstract
Reduction of MPs density by almost 20% is attributable to ion sputtering after 2Â min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
A.I. Ryabchikov, D.O. Sivin, A.I. Bumagina,