Article ID Journal Published Year Pages File Type
5350567 Applied Surface Science 2014 4 Pages PDF
Abstract
Si(1 1 1)-In surface reconstructions for submonolayer coverages were investigated at room temperature using X-ray photoelectron spectroscopy, Auger electron spectroscopy and low-energy electron diffraction. Deposition rate influence on the formation of surface structures is reported. It was observed that for sufficiently low deposition rate and certain annealing process Si(1 1 1)√7 × √3-In surface reconstruction at coverage as low as 0.2 ML is present.
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Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
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Low coverage Si(1 1 1)√7 × √3-In reconstruction: Deposition rate effect
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