| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5350608 | Applied Surface Science | 2015 | 10 Pages |
Abstract
- Sub-micrometric silicon structures were prepared by cryogenic plasma etching.
- Polymer templates based on phase-separated films of PS/PLA were used.
- Silica structured masks were prepared by filling the polymer templates.
- Etching of underlying silicon through silica templates gave original structures.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Alexane Vital, Marylène Vayer, Christophe Sinturel, Thomas Tillocher, Philippe Lefaucheux, Rémi Dussart,