Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5351146 | Applied Surface Science | 2014 | 6 Pages |
Abstract
With the rapid increase of data storage density on computer hard disk drives (HDDs), the operation distance between read/write head and disk surface has fallen to just a few nanometers. Chemical mechanical planarization (CMP) has been selected as the best process to produce high quality surface finish during the manufacturing of Ni-P alloy substrates for HDD applications. Herein we report, for the first time, the use of benzotriazole (BTA) as a passivating agent in CMP slurries to decrease the surface roughness (Ra). Results show that the average Ra of the polished surfaces is decreased to 0.2 nm in a 5 μm Ã 5 μm scan area with the adding of 2 mM BTA. X-ray photoelectron spectroscopy (XPS) and electrochemical studies results further prove the interaction between BTA and Ni-P surface and the formation of an effective passivating layer on Cu in CMP slurries containing BTA.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yan Mu, Mingjie Zhong, Kenneth J. Rushing, Yuzhuo Li, Devon A. Shipp,