Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5351500 | Applied Surface Science | 2014 | 33 Pages |
Abstract
- Ni-Al co-doped ZnO (NiAl:ZnO) composite thin films were deposited by DC sputtering at low sputtering power.
- All films showed a highly preferential (0Â 0Â 2) c-axis orientation.
- NiAl:ZnO (5 wt% Ni) film deposited at 40 W at 6.0 mTorr has the lowest resistivity of 2.19 Ã 10â3 Ω cm.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
JongWoo Lee, K.N. Hui, K.S. Hui, Y.R. Cho, Ho-Hwan Chun,