| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5351843 | Applied Surface Science | 2014 | 7 Pages |
Abstract
- Substrate-plasma polymer film interfaces were exposed allowing the underside of the films to be examined and compared with the top side.
- Both sides of the plasma polymer films were examined using X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy.
- High input power during polymerization produced plasma polymer films with chemical gradients, which contain more ether units at the initial formation stage compared with the top layer.
- Film chemistry was dependent on the type of substrate used for the plasma polymerization deposition.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yali Li, Benjamin W. Muir, Christopher D. Easton, Lars Thomsen, David R. Nisbet, John S. Forsythe,