| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5352866 | Applied Surface Science | 2013 | 5 Pages |
Abstract
⺠Thin films of TiO2âx are deposited by means of dc-pulsed reactive sputtering. ⺠X-ray spectroscopic techniques are used to study electronic and structural properties. ⺠Contribution from Ti3+ oxidation states appears in nonstoichiometric TiO2âx. ⺠Band gap energies derived from the optical spectra and RXES analysis are consistent.
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Authors
K. Kollbek, M. Sikora, Cz. Kapusta, J. Szlachetko, K. Zakrzewska, K. Kowalski, M. Radecka,