Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5353020 | Applied Surface Science | 2013 | 4 Pages |
Abstract
Fe(NO3)3/HF mixed solution was used to replace traditional HNO3/HF mixed solution to produce low reflective texture on the multicrystal silicon (mc-Si) surface. A low reflective microstructure having hemispherical etched pits with needle-like folds was obtained. The surface reflectance of the etched mc-Si wafers was analyzed by spectrophotometer and the morphologies of the textured mc-Si wafers were observed by scanning electron microscopy. It was found that the light trapping effect was greatly enhanced by the microstructure produced by etching in the mixed solution of Fe(NO3)3/HF, which results in a significant reduction of the light reflectance at the mc-Si surface. Moreover, the etching time and the concentration of Fe(NO3)3 determine the etched pit size and the morphology of the needle-like folds microstructure. The surface reflectivity in the wavelength range from 400Â nm to 1000Â nm is only 6.15% when the etching time and the concentration of Fe(NO3)3 are 40Â min and 0.3Â M respectively.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Lidian Zhang, Honglie Shen, Zhihao Yue, Wei Wang, Ye Jiang,