| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5353199 | Applied Surface Science | 2016 | 6 Pages |
Abstract
The resistance mechanism against plasma etching has been studied mainly by XPS experiments, which revealed the formation of YF3 layer on the surface of Y2O3 coating exposed to CF4 plasma, as evidenced by the existence of 3d XPS peaks of YF bonding and the concentration of F element at outmost surface.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yu-Chao Cao, Lei Zhao, Jin Luo, Ke Wang, Bo-Ping Zhang, Hiroki Yokota, Yoshiyasu Ito, Jing-Feng Li,