Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5353240 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠Tightly focused femtosecond laser beams at 1.3-μm wavelength are used for local energy deposition inside silicon. ⺠Non-linear absorption is independent on the doping concentration of the silicon substrates. ⺠The confinement of the interaction can be maintained for thick samples by compensating for spherical aberration. ⺠The demonstrated local laser energy deposition opens a way for 3D machining inside semiconductors.
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Authors
S. Leyder, D. Grojo, P. Delaporte, W. Marine, M. Sentis, O. Utéza,