| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5353302 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠Novel idea to integrate interference and colloid-sphere lithography. ⺠Finite element method used to present the capabilities of integrated lithography. ⺠Tuning four structure parameters independently by integrated lithography. ⺠Illumination of silica sphere monolayer by two interfering beams. ⺠Effect of wavelength, sphere diameter, orientation and polarization on near-field distribution.
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Authors
Áron Sipos, Anikó Szalai, Mária Csete,