Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5353442 | Applied Surface Science | 2016 | 4 Pages |
Abstract
The conducted tests allow drawing the following conclusions. The level of surface development does not depend on the applied potential at which deposition of cobalt is carried out. Deposition at low potentials result in creating, on the surface the mixture of metallic cobalt and hydroxides with high level of surface development. High concentration of cobalt ions in the solution result in obtaining close values of the surface development level irrespective of the applied deposition potential.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Sylwia Banbur-Pawlowska, Krzysztof Mech, Remigiusz Kowalik, Piotr Zabinski,